The Supermag® SCM Maglev Wafer Rotation System is designed for wafer support and rotation in semiconductor equipment. Utilizing advanced magnetic levitation bearing and motor integrated control technology, it surpasses long-standing foreign technological monopolies, with several parameters exceeding international standards. The rotor levitates and rotates without friction, dynamic seals, or particle generation, making it ideal for high-end chip manufacturing processes. These processes include oxidation, diffusion and annealing, rapid thermal processing (RTP), rapid thermal annealing (RTA), rapid thermal oxidation (RTO), rapid thermal nitridation (RTN), atomic layer deposition (ALD), chemical vapor deposition (CVD), single-wafer cleaning, metal-organic chemical vapor deposition (MOCVD), etching, spin coating, and more.
Product Highlights
Product Series
Parameter Characteristics
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Product Highlights

No Mechanical Friction, No Dynamic Seals, No Lubricants Required


Magnetic Levitation Support, Hollow Rotor, Clean and Reliable.

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Integrated Magnetic Levitation and Motor Control


Featuring advanced control software, our system supports remote tuning support and seamless communication with upper-level systems such as PLCs and PCs. It is compatible with all Supermag® motor models.

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Adjustable Speed and Precise Control


Speed Range: 20-2500 RPM for precise control.

Fully Independently Developed, Customizable


International patents, Customizable to meet semiconductor process requirements.

Auto Zero Position and Adjustable Height


Designed to meet the rigorous demands of semiconductor process inspections.

Compatible with Various Wafer Sizes


Suitable for inspecting 6", 8", and 12" wafers.




Parameters and Features

Parameter Specifications:


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Product Q&A Videos:


Documents

SCM Maglev Wafer Rotation System_Leaflet

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